Fabrication of Disilicide Films Prepared by a Printing Technique

We demonstrate a cost-effective route for fabricating printed films of NbSi₂, a crystallographically chiral compound. Polycrystalline NbSi₂ powder was synthesized via a solid-state reaction and mixed with polyamic acid to produce a homogeneous slurry. The resulting slurry was printed onto Si substrates and subsequently dried at room temperature. The printed films consisted of single-phase polycrystalline NbSi₂ with a thickness of approximately 60 μm and a surface roughness of 2 μm. The Van der Pauw measurements revealed metallic resistivity of printed films.