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Analysis shows surface-localized states significantly influence optical properties in silicon modifications, indicating new insights.
Reflection anisotropy spectroscopy is widely used to probe the optical properties of surfaces, yet the origin of the ’bulk-related’ features has been debated for decades. It is often argued that these features are related to surface-induced bulk anisotropy because they coincide with critical energies of the bulk dielectric function. Here, we show that a quantitative understanding of these features requires an explicit analysis of excitonic contributions. We introduce a layer-resolved exciton localization measure within the framework of many-body perturbation theory, enabling a direct assessment of the spatial origin of optical anisotropies. Applying this approach to arsenic-modified silicon reconstructions, we find that, depending on the surface structure, the apparent ’bulk-related’ features originate predominantly from surface-localized states. Supported by low-temperature reflection anisotropy measurements, our findings challenge the traditional explanation of surface-induced bulk anisotropy and suggest that bulk-enhanced surface anisotropies also contribute to, or are responsible for, these features.
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Großmann et al. (2026) studied this question.
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