Interferometry reveals spatial and temporal dynamics of electron density in high-energy discharges, indicating insight into plasma behavior.
This paper describes the construction and application of an optical-frequency Michelson interferometer for measuring electron number density within high-energy, high-power nanosecond pin-to-pin discharges (>10 mJ pulse energy, >1 MW pulse power). A 21 mJ, 11 ns spark across a 3 mm pin-to-pin electrode gap was analyzed at 7 ns into the discharge to demonstrate the operation of the interferometer. A peak electron density of 2.3 × 10¹⁷ cm⁻³ was observed at these conditions, and it was consistent with estimates of plasma channel resistance based on V-I measurements. This initial work paves the way for a larger parametric study of the spatial and temporal dynamics of electron number density in nanosecond pin-do-pin discharges under various conditions.
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Babusis et al. (2025) studied this question.
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