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March 21, 2026IMAPSource Proceedings

Complex Permittivity Measurements of Substrates and Thin Films at Millimeter-wave Frequencies

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Authors

LELucas EnrightBBBryan BosworthNJNick Jungwirth

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Overview

This work develops reliable permittivity standards for device modeling, indicating significant advances in high-frequency measurements.

Key Points

  • The aim is to establish reliable measurement standards for dielectric properties at millimeter-wave frequencies.
  • Utilized split-cylinder resonators for measuring dielectric properties.
  • Developed SI-traceable standards using fused silica substrates.
  • Conducted uncertainty analysis to assess measurement reliability.
  • Extended theory and measurements to include thin films on substrates.
  • Achieved reliable measurements for homogeneous substrates.
  • Demonstrated effective techniques for examining thin films like AlN and SU-8 on various substrates.
  • Identified limitations in measurement accuracy and methodology for heterogeneous material stacks.

Cite This Study

Enright et al. (2026) studied this question.

synapsesocial.com/papers/69be37726e48c4981c677238https://doi.org/10.4071/001c.156178
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