Plasma-Enhanced Chemical Vapor Deposition Fabrication of Organosilicon Superhydrophilic Antifogging Coatings: The Effect of Deposition Voltage

To develop high-performance and durable antifogging coatings, a superhydrophilic coating is fabricated via a one-step plasma-enhanced chemical vapor deposition process using vinyltrimethoxysilane as a precursor. The effects of deposition voltage and pressure (low pressure and atmospheric pressure) on the antifogging performance are systematically investigated. The chemical composition and surface morphology of the resulting coatings are characterized by XPS, FTIR, SEM, and AFM. The results demonstrate that the coating is primarily composed of silicon-oxygen constituents with an abundance of hydrophilic active groups, which is critical for achieving superhydrophilicity, as evidenced by a water contact angle below 10°. The coatings exhibit excellent antifogging properties, maintaining effectiveness for up to 45 days. This study provides an efficient one-step strategy for material surface modification, significantly enhancing the hydrophilicity and durability of substrates, thereby offering both theoretical insight and practical support for the application of high-performance antifogging coatings.