Colloidal lithography creates nanostructures on substrates, implying potential advancements in nanotechnology applications.
The key features of the colloidal lithography method are described, and the results obtained during the initial stage of its development for solving problems of manufacturing thin-film nanostructure arrays on a substrate surface, as well as problems of surface nanostructuring, are discussed. The presented material can be useful for analyzing the potential for expanding the scope of colloidal lithography.
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V. P. Kudrya (2025) studied this question.
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