On the practical utility of nanoimprint lithography for a small research laboratory

Nanoimprint lithography is a technique that promises a low-cost, high-throughput, and high-resolution method for fabricating nanostructures, which may be used in communications, sensing, and emerging technologies such as augmented reality glasses. We present a comprehensive analysis of an ultraviolet nanoimprint lithography protocol using a resin-stamp platform, introduced by OpTool AB, for the production of 1D and 2D guided mode resonance grating structures. We assess their performance optically, a method rarely reported, to investigate the device functionality and make practical comparisons to electron-beam lithography. We achieve a representative resolution of 30 nm, which leads to good optical resonances, but we also note issues with inconsistent patterning over large areas ( > 1 mm²) and short shelf-lives of the chemicals involved. We conclude that, while NIL can fabricate structures on a par with electron beam lithography, it also presents some challenges in producing functional devices at lower throughputs, a key consideration for small research laboratories.