This work investigates process parameters influencing photoresist film quality, suggesting optimized conditions for better outcomes.
In this work we investigate the influence of parameters of electrostatic-assisted ultrasonic spray process on the quality of deposited photoresist film. We have observed forming and drying of liquid film, forming of dried aerosol layer and in situ drying process, according to deposition parameters variation. Best film quality was achieved at the temperature, significantly lower than typical photoresist drying temperature.
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Petukhov et al. (2025) studied this question.
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