Capillary-filling-regulated direct soft imprint lithography for coffee-ring- and residue-free stacked-layer patterning

Qi Zhou; Ruibin Liang; Yutian Liu; Kangxin Shen; Jiale Huang; Shuguang Zhang; Linfeng Lan; Huimin Su; Jintao Xu; Baozhong Chen; Junbiao Peng

doi:10.1039/d6tc00223d

January 1, 2026Journal of Materials Chemistry C

Capillary-filling-regulated direct soft imprint lithography for coffee-ring- and residue-free stacked-layer patterning

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Key Points

The aim is to enhance direct soft imprint lithography by regulating capillary filling to minimize imprint residues and improve pattern fidelity.
Developed a capillary-filling-regulated technique for DSIL.
Conducted tests to evaluate imprint residues and thickness uniformity.
Analyzed overlay printing accuracy using the new method.
Significant reduction in imprint residues.
Improved uniformity of layer thickness in patterns.
Enhanced accuracy of stacked-layer overlays.

Implication

Direct soft imprint lithography improves layer patterning while eliminating residues in microfabrication, suggesting a viable alternative to photolithography.

Abstract

Direct soft imprint lithography (DSIL) provides a simple, high-resolution, and low-cost patterning alternative to photolithography. However, the imprint residues, thickness nonuniformity, and overlay printing problems of DSIL limit its practical...

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Cite This Study

Zhou et al. (2026) studied this question.

synapsesocial.com/papers/69cf5de95a333a821460bef9 https://doi.org/10.1039/d6tc00223d

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Capillary-filling-regulated direct soft imprint lithography for coffee-ring- and residue-free stacked-layer patterning

Key Points

Implication

Abstract

Discussion

Cite This Study

Capillary-filling-regulated direct soft imprint lithography for coffee-ring- and residue-free stacked-layer patterning

Key Points

Implication

Abstract

Discussion

Cite This Study

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