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April 3, 2026Journal of Applied Physics

Effect of growth temperature on the quality and interfacial thermal conductance of GaN/AlN heterostructure: A molecular dynamics study

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Authors

ESErping SunShandong University of Science and TechnologyWLWenzhu LuoNanjing University of Information Science and TechnologyLWLei Wang

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Implication

Molecular dynamics simulations investigate the impact of growth temperature on interfacial conductance in GaN/AlN heterostructures, suggesting improvements for thermal management.

Key Points

  • The study aims to understand how growth temperature affects the quality and thermal conductance of GaN films.
  • Conducted molecular dynamics simulations of GaN films at growth temperatures ranging from 500 to 1700 K.
  • Analyzed phonon density of states and spectral heat flux to assess heat transfer characteristics.
  • Compared interfacial thermal conductance of GaN/AlN heterostructures under various growth conditions.
  • Surface roughness of GaN films decreases as growth temperature increases.
  • Crystallinity improves and dislocation density reduces with higher temperatures.
  • Interfacial thermal conductance reaches a peak of 535 MW/(m2 K) at 1000 K before declining.

Cite This Study

Sun et al. (2026) studied this question.

synapsesocial.com/papers/69cf5e115a333a821460c260https://doi.org/10.1063/5.0320914
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