Efficient high-speed near-infrared Ge photodetectors integrated on Si substrates

We have fabricated Ge/Si heterojunction photodetectors with high responsivities of 550 mA/W at 1.32 μm and 250 mA/W at 1.55 μm and time responses shorter than 850 ps. High quality Ge was epitaxially grown on Si using ultrahigh vacuum/chemical vapor deposition followed by cyclic thermal annealing. The beneficial effect of the post-growth thermal annealing on the electrical properties of Ge epilayers, due to the reduction of threading-dislocation densities, is confirmed by the dramatic enhancement of the performance of the photodetectors.