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June 15, 2005Journal of Applied Physics

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

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RPRiikka L. PuurunenAalto University

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Riikka L. Puurunen (2005) studied this question.

synapsesocial.com/papers/69dcfec6d111c0385b359b0chttps://doi.org/10.1063/1.1940727
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