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State-of-the art pulsed UV excimer laser technology has a proven track record of stable performance under three-shift operation conditions in various industrial thin-film applications at stabilized pulse energy levels ranging from 100 to 1000 mJ per pulse. For the last 25 years excimer laser technology has formed the backbone of pulsed laser deposition advances. The available UV average power level nowadays exceeds 1 kW and novel excimer laser beam utilization schemes in combination with sophisticated substrate–target geometries are ready to utilize the full laser upscaling potential and thereby reduce unit costs.
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Delmdahl et al. (2013) studied this question.
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