This research investigates novel acid etching systems to improve solar cell performance in monocrystalline silicon, suggesting a sustainable fabrication method.
Key Points
The study aims to enhance light absorption in monocrystalline silicon wafers through innovative surface texturing methods.
Investigated three ternary acid etching systems: HF:HNO3:KMnO4, HF:H2SO4:KMnO4, HF:H2O2:KMnO4.
Compared these with conventional KOH:IPA:DI water texturing.
Analyzed properties using UV–vis spectroscopy, FTIR, FESEM, and minority carrier diffusion measurements.
HHP etching reduced average reflectance from 30.1% to 8.2% while maintaining a minority carrier lifetime of ≈25.6 μs.
HHP provided comparable or superior optical and electrical properties compared to KOH:IPA:DI water texturing.
The HHP system is environmentally friendly, producing harmless by-products like water and oxygen.