Space charge, plasma potential and electric field distributions in HiPIMS discharges of varying configuration

An electron-emitting (emissive) probe has been used to study the temporal and spatial distribution of the plasma potential during high-power impulse magnetron sputtering (HiPIMS) discharges with various substrate and magnetic field configurations. The average power was 700 W, with a repetition frequency of 100 Hz and pulse duration of 100 µs. Strongly negative plasma potentials exceeding −300 V and electric fields up to 10 kV m−1, caused by strong separation of charges with net charge carrier densities Δn of about 1014 m−3, were observed during the ignition of the discharge. The spatial distribution of the plasma potential in the stable stage of the discharge showed values consistently 5 V more negative for a floating substrate compared with a grounded one, so enhancing electron transport around the insulated substrate to grounded walls. However, this change in the electrical configuration of the plasma does not alter significantly the fraction of ionized sputtered particles (of about 30%) that can potentially reach the substrate. By changing the degree of unbalance of the sputtering source, we find a strong correlation between the electric field strength in the magnetic trap (created through charge separation) and the absolute value (and shape) of the magnetic field. For the more unbalanced magnetron, a flattening of the plasma potential structure (decrease in the axial electric field) was observed close to the target. Our findings show in principle that manipulation of the potential barrier close to the target through changing the magnetic field can regulate the proportion of sputtered and ionized species reaching the substrate.