The aim is to advance patterning methods for CMOS-relevant dielectrics by utilizing van der Waals anisotropy.
Utilized instability-driven techniques for patterning without the need for elastic substrates.
Focused on subwavelength patterning methods applicable at room temperature.
Investigated the role of van der Waals forces in shaping dielectrics.
Demonstrated effective patterning of amorphous dielectrics at room temperature.
Showed significant potential for CMOS applications with lithography-free techniques.
Abstract
. By removing reliance on elastic substrates, this work extends the scope of instability-driven, lithography-free subwavelength patterning to CMOS-relevant dielectrics.