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layer effectively increases the oxygen vacancy content within the bottom gate dielectric, facilitating oxygen vacancy migration-based memory operation primarily through the bottom gate. The resulting asymmetry between the top and bottom gates was systematically analyzed using low-frequency noise (LFN) characterization, elucidating for the first time the distinct impacts of oxygen vacancy modulation on device electrical behavior and operational mechanisms. This comprehensive LFN analysis provides critical insights into the fundamental dynamics of defect-mediated memory operation, highlighting the importance of dielectric engineering in optimizing next-generation oxide-based electronic devices.
Jeong et al. (Fri,) studied this question.