A Comparative Study of Amorphous, Anatase, Rutile, and Mixed Phase TiO₂Films by Mist Chemical Vapor Deposition and Ultraviolet Photodetectors Applications

This paper presents growing amorphous, anatase, rutile, and mixed phases titanium dioxide (TiO 2 ) thin films by mist chemical vapor deposition and post deposition annealing techniques. The annealing temperature affects crystal structures of the TiO 2 films significantly. X-ray diffraction and Raman spectra are used to characterize the structures of the TiO 2 films. X-ray photoelectron spectroscopy is used to analyze the chemical composition of the TiO 2 film. The optical characteristics, including refractive index, extinction coefficient, optical absorption coefficient, and photoluminescence spectrum are measured. Finally, the metal-semiconductor-metal photodetectors are fabricated and their current-voltage, Schottky barrier height, photoresponse characteristics, response time, and detectivity characteristics are investigated. The research results show that these crystal structures of the TiO 2 demonstrate their specific advantages in the performance of the photodetectors.