Investigates measurement accuracy of thin films in nanotechnology, indicating new technical support for precision manufacturing.
In the context of the increasing demands of precision manufacturing and nanotechnology, especially for emerging fields such as Oxide oxide films in Nuclear nuclear fuel assemblies, the measurement of multi-layer inhomogeneous thin films faces significant challenges. Traditional spectroscopic interference thickness measurement techniques have limitations in handling dispersion interference, parameter coupling, and the efficient solution of nonlinear inverse problems. This study proposes a new model that integrates deep learning and physical model fitting. It constructs a theoretical model of multi-layer thin-film interference spectroscopy based on the Lorentz–Drude formula, uses a generative adversarial network (GAN) for initial structure analysis, and builds a two-layer optimization framework of “deep learning rough positioning—physical model fine fitting”. The research aims to break through the limitations of traditional methods, improve measurement accuracy and anti-noise ability, and provide a key technical support for emerging fields.
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Wu et al. (2026) studied this question.
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