In this article, we report the fabrication of SnO2 thin film transistors (TFTs) fabricated by reactive evaporation. Different from the previous reports, the fabricated TFTs exhibit p-type conductivity in its undoped form. The postdeposition annealing temperature was tuned to achieve p-channel SnO2 TFTs. The on/off ratio and the field-effect mobility were ∼103 and 0.011cm2∕Vs, respectively. To demonstrate inverter circuit, two devices with different threshold voltages were combined and an output gain of 2.8 was achieved. The realization of p-channel oxide TFTs would open up new challenges in the area of transparent electronics.
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Ou et al. (2008) studied this question.
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