Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature

This paper reports the synthesis of nanostructure carbon (ns-carbon) films deposited by microwave plasma-enhanced chemical vapor deposition (MW PECVD) technique at low pressure and room temperature. ns-carbon films have been characterized by scanning electron microscopy, electron dispersive x-ray spectroscopic analysis, atomic force microscopy, Raman spectroscopy, X-ray diffraction, UV-visible spectroscopy and high-resolution transmission electron microscopy. The shape of nanostructure is changing from granular to sheet-like structure when the pressure increased from 55 to 110 mTorr.