Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

ADVERTISEMENT RETURN TO ISSUEPREVReviewNEXTBlock Copolymer Based Nanostructures: Materials, Processes, and Applications to ElectronicsHo-Cheol Kim*, Sang-Min Park, and William D. HinsbergView Author Information IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120* To whom correspondence should be addressed. Phone: 408-927-3725. Fax: 408-927-3310. E-mail: [email protected]Cite this: Chem. Rev. 2010, 110, 1, 146–177Publication Date (Web):December 1, 2009Publication History Received21 April 2009Published online1 December 2009Published inissue 13 January 2010https://doi.org/10.1021/cr900159vCopyright © 2009 American Chemical SocietyRequest reuse permissionsArticle Views18560Altmetric-Citations860LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit Read OnlinePDF (11 MB) Get e-AlertscloseSUBJECTS:Copolymers,Organic compounds,Self organization,Silicon,Thin films Get e-Alerts