Real-time statistical process control using tool data (semiconductor manufacturing)

A process monitoring scheme that takes advantage of real-time information in order to generate malfunction alarms is described. This is accomplished with the application of time-series filtering and multivariate statistical process control. This scheme is capable of generating alarms on a true real-time basis, while the wafer is still in the processing chamber. Several examples are presented with tool data collected from the SECSII port of single-wafer plasma etchers.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>