Room Temperature Ferromagnetism Engineered in Two-Dimensional Metallic Magnets via Metal–Insulator–Semiconductor Structures

The development of novel information-functional devices based on emergent physical phenomena is crucial for integrated circuit technology in the post-Moore era. Two-dimensional magnetic materials present an ideal platform for spintronic devices; however, regulating their room temperature magnetism poses significant challenges. Traditional methods like ionic liquid gating and strain control face issues such as poor stability and complex processes, complicating compatibility with standard silicon technology. Here, we demonstrate a straightforward and robust approach for dielectric layer-engineered room temperature ferromagnetism in 2D metallic magnets by leveraging metal–insulator–semiconductor (MIS) structures. Using surface-oxidized Fe3GeTe2 as a model system, we systematically investigate how SiOx dielectric layer thickness (50–300 nm) modulates magnetic properties. Thin dielectric layers significantly enhance room temperature ferromagnetism through boosted interfacial charge transfer, whereas thick layers maintain the material near its intrinsic state due to dielectric screening effects. Furthermore, reversible optical modulation of magnetism is achieved under ultraviolet illumination, with photoresponse capability diminishing as dielectric thickness increases. This work establishes a scalable, silicon-compatible strategy for controlling 2D magnetism and provides critical insights for developing optically tunable spintronic devices and non-volatile memory applications.