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An analytical electron microscope has been used to fabricate a variety of ultrasmall structures and to test the size limits and some basic concepts of high-resolution electron-beam lithography. Arbitrarily shaped patterns on both thin film and bulk substrates have been written with dimensions of approximately 10 nm. A review of devices, structures, materials, and techniques is presented.
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H. G. Craighead (1984) studied this question.
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