Structure of a 1:1 Adduct of Silyl Chloride and Dimethyl Ether at 100 K

An X-ray structure analysis of the adduct 1 at 100 K revealed an SiO distance of 2.27 Å, which can be interpreted in terms of a weak bonding or strong interaction. All other in-termolecular SiO distances determined so far are distinctly larger. The reason could be the relatively high basicity of Me2O, which leads to the formation of a bond despite the weak acceptor strength of H3SiCl.