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October 12, 2017Journal of Applied Physics

Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage

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FAFaizan AliInstitut de Ciència de Materials de BarcelonaXLXiaohua LiuDalian University of TechnologyDZDayu ZhouDalian University of Technology

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Ali et al. (2017) studied this question.

synapsesocial.com/papers/6a152b6c79ff98d0de4e30adhttps://doi.org/10.1063/1.4989908
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