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December 1, 1993Japanese Journal of Applied Physics

Patterning of Self-Assembled Films Using Lithographic Exposure Tools

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Authors

WDWalter J. DressickThe Ohio State UniversityJCJeffrey M. CalvertDow Chemical (United States)

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Dressick et al. (1993) studied this question.

synapsesocial.com/papers/6a19957cbdd35483aadebfa5https://doi.org/10.1143/jjap.32.5829
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Also Consider

Synapse has enriched 2 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1Photopatterning and selective electroless metallization of surface-attached ligands1993 · 106 citations
  2. 2Deep ultraviolet patterning of monolayer films for high resolution lithography1991 · 44 citations