Thin film growth by a non-vacuum deposition technique, namely, the chemical solution deposition (CSD) method, is reviewed with emphasis on the growth of various oxide films and their properties. Various aspects of the solution chemistries for the different routes are discussed, and the effects of solution precursor properties on the conversion of the as-deposited film to the desired phase are also discussed. Crystal structures and functional properties common to many oxide materials are briefly reviewed.
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Bhuiyan et al. (2006) studied this question.
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