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Plasmonic metamaterials are used for the fabrication of spectrally selective narrow-band mid-infrared thermal emitters operating at high temperatures. Using refractory materials, molybdenum and aluminum oxide in this case, high temperature operation has been demonstrated in vacuum up to 1000 °C. Colloidal mask etching is adopted to realize large-scale and cost-effective fabrication. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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Yokoyama et al. (2016) studied this question.
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