Modeling and analysis of high-speed electro-optic modulation in high confinement silicon waveguides using metal-oxide-semiconductor configuration

We analyze the electrical and optical properties of a silicon electro-optic waveguide modulator using a metal-oxide-semiconductor (MOS) configuration. The device performance is studied under different modes of operation of the MOS diode and gate oxide thicknesses. Our calculations indicate that this scheme can be used for achieving high-speed submicron waveguide active devices on silicon on insulator. A microring resonator intensity modulator is predicted to exhibit switching times on the order of tens of picoseconds with modulation depth of 73% by employing a bias voltage of only 5 V.