A glass transition phase forms at the Ni-Si interface as a precursor to NiSi2. The crystalline to amorphous transformation occurs when a sufficient concentration of Ni atoms is present to raise the elastic energy of crystalline Si and lower the energy barrier to the reaction. NiSi2 crystals nucleate in the glass at the interface. The barrier height can depend on properties of the amorphous layer.
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D. M. Vanderwalker (1986) studied this question.
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