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From a comparison of three calculations, we conclude that the unrelaxed vacancy in Si introduces a T₂ bound level in the gap and two A₁ resonances in the valence band. The lower one, in the first minimum of the density of states, is only weakly localized and the other, near the valence-band edge, corresponds to the symmetric combination of the dangling bonds. Preliminary results for the relaxed vacancy are also discussed.
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Kauffer et al. (1977) studied this question.
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