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Atomic deposition on a surface can be controlled at the nanometre scale by means of optical and magnetic forces. Impingement of atoms on the surface can lead to growth of a structured array (direct deposition) or to chemical modifications of the surface (neutral atom lithography). In this report we survey requirements, present the current results, and explore the potential applications of this method of nanofabrication.
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Meschede et al. (2003) studied this question.
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