The reverse polarity change from a polar to a nonpolar state has been successfully incorporated in the design of chemical amplification resists. The imaging mechanism is based on the pinacol-pinacolone rearrangement, wherein vic-diols (pinacols) are converted to ketones or aldehydes with photochemically generated acid as a catalyst. In addition to a polymeric pinacol which undergoes the rearrangement very cleanly in the solid state, aqueous base developable three-component negative deep UV resist systems are described, which are based on phenolic resins, small pinacols, and triphenylsulfonium hexafluoroantimonate as the acid generator.
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Sooriyakumaran et al. (1991) studied this question.
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