Explores how annealing affects conductivity in ultrathin ZnSnO films, indicating important implications for electronic applications.
This work explores how annealing influences the properties of ultrathin amorphous zinc tin oxide (38 nm thick a-ZTO) thin films fabricated by magnetron sputtering. The samples were subjected to post-deposition annealing at temperatures between 200 °C and 300 °C in an oxidizing environment, consisting of an O 2 /N 2 gas mixture. During the annealing process, the sheet resistance of the films was continuously monitored using in situ measurements. In-situ monitoring reveals a transition from semiconducting to metallic-like transport as the resistivity reaches its minimum. Optimized annealing yields films with conductivity up to 430 S cm − 1 , carrier concentration 1 . 5 × 1 0 20 cm − 3 , and mobility 19 cm 2 V − 1 s − 1 , without compromising optical properties. Complementary density functional theory (DFT) calculations suggest that the formation of oxygen-related species such as peroxo (O 2 2 − ) and ozonide (O 3 − ) groups play a role in modifying the electronic structure and contributing to carrier transport, while the dominant effect arises from defect reorganization and mobility enhancement.
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Kaisha et al. (2026) studied this question.
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