Automated transportation of auxiliary resources in a semiconductor manufacturing facility

In this paper, we study the design of an Automated Guided Vehicle (AGV) transport system for the main auxiliary resource, the mask (also called reticle), in the photolithography area of a semiconductor wafer fabrication facility. We propose two approaches: A static approach based on a simple formula and a dynamic approach relying on a discrete-event simulation model. All the elements of the proposed transport system are characterized. Different layouts and dispatching rules are evaluated and compared using Key Performance Indicators such as the number of performed transport requests, and the assignment and delivery times. Based on these indicators, we show that dispatching rules have a significant impact on the number of required vehicles to perform all the transport requests and that layouts affect the assignment and delivery times. Finally, we have been able to define the adequate transport system that can absorb the transport demand and fits the production environment.