All-Carbon Patterning of HOPG on the Nanometer Scale with non-IPRFullerenes

Artur Böttcher; Stefan-Sven Sven Jester; Daniel Löffler; Johannes Seibel; Manfred Kappes

doi:10.1039/d6nr00926c

January 1, 2026NanoscaleOpen Access

All-Carbon Patterning of HOPG on the Nanometer Scale with non-IPRFullerenes

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Key Points

This research aims to explore the creation of carbon defect patterns on the surface of HOPG at the nanometer scale.
Used Ga⁺ focused ion beam writing to create arrays of amorphous carbon defects on the HOPG basal plane.
Analyzed the structural properties of the resultant carbon patterns to assess their viability for applications.
Conducted precision measurements to evaluate the fidelity of the nanometer scale patterns.
Successfully created defined amorphous carbon defects on HOPG at nanometer precision.
Demonstrated that the introduced defects can potentially enhance the material's applications in nanotechnology.
Analysis indicated improved control over defect placement, suggesting advancements in nanofabrication techniques.

Implication

Examines carbon defect arrays in HOPG, indicating potential for nanofabrication applications.

Abstract

Arrays of amorphous carbon defects were prepared on the basal plane of highly oriented pyrolytic graphite (HOPG) using Ga⁺ focused ion beam (FIB) writing. These defects were then used as...

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Cite This Study

Böttcher et al. (2026) studied this question.

synapsesocial.com/papers/6a34ddaf65a5b0777af2d57d https://doi.org/10.1039/d6nr00926c

View Full Paper

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All-Carbon Patterning of HOPG on the Nanometer Scale with non-IPRFullerenes

Key Points

Implication

Abstract

Discussion

Cite This Study

All-Carbon Patterning of HOPG on the Nanometer Scale with non-IPRFullerenes

Key Points

Implication

Abstract

Discussion

Cite This Study

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