Review summarizes advancements in quantum dot patterning for improved AR/VR displays, highlighting their significance.
Quantum dots (QDs) have emerged as promising emissive materials for next-generation displays owing to their narrow emission bandwidth, high color purity, and solution processability. However, achieving non-destructive, high-resolution patterning of QDs–defined as patterning process that preserve the intrinsic optical and electrical properties of QDs–at the sub-micrometer scale remains a major challenge for realizing advanced QD light-emitting diodes (QLEDs). To address this, diverse patterning strategies, including inkjet printing, transfer printing, photolithography, and direct patterning, have been developed to combine chemical stability with precise spatial control. These techniques aim to preserve the intrinsic optical and electrical properties of QDs while enabling high-resolution arrays. Such progress is pivotal for next-generation displays, particularly in augmented and virtual reality (AR/VR) devices, which demand ultra-fine pixelation, high efficiency, and wide color gamut. This review summarizes recent advances in QD patterning and discusses further directions toward scalable, high-performance display technologies.
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Park et al. (2026) studied this question.
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