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Due to the high saturation magnetization (~2.4 T), <TEX>Fe₁₆N₂</TEX> is interesting for the thin film application such as an actuator, data record storage and sensor etc. In this study, Fe-N thin films were deposited on Si(001) substrate with various power and deposition time by DC magnetron sputtering, in order to get high portion of <TEX>Fe₁₆N₂</TEX> phase. Surface morphology, phase formation and magnetic properties were measured. As a result, Saturation magnetization and Remanence magnetization reach to ~2.45 T and 1.41T. But, Coercivity was not enough in this experiments. Its value lower than 100 Oe. Which is very close to theoretical value.
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Han et al. (2017) studied this question.
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