This randomized trial demonstrates a giant pseudo-piezoelectric response in HfZrO2 thin films, suggesting new applications in advanced materials.
The electromechanical properties of hafnium zirconium oxide fluorite (Hf 0.5 Zr 0.5 O 2 , HZO) remain largely unexplored despite its widespread use as a ferroelectric in CMOS-compatible devices. Here, we demonstrate that electrostriction-driven phase instability enables a giant pseudo-piezoelectric response in epitaxial HZO thin films. Above a critical field of 24 kilovolts per centimeter, field-induced transitions between nonpolar and polar phases activate an extrinsic piezoelectric response of ~1000 picometers per volt and bias-stabilized pseudo-piezoelectric strains exceeding 10,000 picometers per volt. This behavior arises from a combination of large electrostriction ( M = 1 × 10 −14 square meters per square volt), ferroelastic softness, and structural reconfiguration, rather than intrinsic polarization switching. Multimodal characterization combining interferometry, diffraction methods, scanning probe microscopy, and first-principles modeling confirms the coupling between strain and metastable phase dynamics. These findings reveal a previously unrecognized mechanism for functional strain generation in fluorite oxides, positioning HZO as a versatile platform for strain-engineered actuators, adaptive metasurfaces, and reconfigurable nanoelectromechanical systems.
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Bergne et al. (2026) studied this question.
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