A Study on the Mechanism of Selective Removal of ZERODUR Microcrystalline Glass by Polishing Abrasives in Magnetorheological Machining

ZERODUR glass-ceramic is widely used in ultra-precision optical components because of its extremely low thermal expansion and excellent dimensional stability. However, its two-phase microstructure, composed of crystalline and amorphous phases with different mechanical properties, may cause non-uniform material removal during magnetorheological polishing, thereby limiting further improvement of nanoscale surface quality. To address this issue, this study investigates the effect of oxide abrasives on the surface homogenization of ZERODUR. A single-particle abrasive–workpiece contact model based on modified Hertz contact theory and elastoplastic contact analysis was established to compare the indentation responses of CeO2, SiO2, and ZrO2 abrasives in the two constituent phases. Magnetorheological polishing experiments were conducted under identical process parameters, and the polished surfaces were characterized by AFM over scan areas of 2 μm × 2 μm, 5 μm × 5 μm, and 10 μm × 10 μm. The results show that all three abrasives improved the surface quality of the ring-polished substrate, with ZrO2 achieving the best surface homogenization performance. The lowest roughness, Ra = 0.104 nm, was obtained at a 2 μm field of view, and the ZrO2-polished surface showed more stable roughness evolution across different scan sizes than the CeO2- and SiO2-polished surfaces. These results indicate that the elastic modulus, hardness, and mechanical compatibility of abrasives with ZERODUR play key roles in governing contact stress, indentation behavior, and final surface quality. This work addresses the lack of mechanistic understanding of abrasive-dependent surface homogenization in the magnetorheological polishing of two-phase ZERODUR glass-ceramic. The main innovation is the integration of contact-mechanics-based abrasive–workpiece modeling with multi-scale AFM characterization to clarify how abrasive mechanical compatibility affects nanoscale surface uniformity and to guide abrasive selection for ultra-smooth optical manufacturing.