Review assesses dielectric characterization methods using high-frequency resonators, highlighting techniques and challenges for telecommunication applications.
The rapid expansion of microwave and millimeter-wave telecommunication systems has intensified the need for precise dielectric material characterization at high frequencies. As operating frequencies increase, small uncertainties in permittivity and loss tangent significantly degrade resonance stability, bandwidth control, and quality factor, directly affecting RF system reliability and performance. However, the growing diversity of resonator architectures and extraction methodologies has led to fragmentation in the literature, making it difficult to identify optimal solutions for telecommunication-oriented applications. This review provides a structured and application-driven assessment of high-frequency resonator-based dielectric characterization techniques relevant to modern telecommunication systems. Resonator topologies—including cavity, planar, substrate-integrated, metamaterial-inspireds—are systematically classified and critically compared. Their sensing mechanisms and parameter-extraction approaches are analyzed in terms of frequency-shift sensitivity, Q-factor performance, scalability toward millimeter-wave bands, integration capability, and measurement robustness. By synthesizing performance trade-offs, practical limitations, and emerging research directions, this review establishes clear design guidelines and a forward-looking framework for advancing dielectric metrology in next-generation high-frequency telecommunication technologies.
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Benhamza et al. (2026) studied this question.
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