Living radical photopolymerization induced grafting on thiol–ene based substrates

The formation of reactive substrates with iniferter‐mediated living radical photopolymerization is a powerful technique for surface modification, which can readily be used to facilitate the incorporation of a variety of surface functionalities. In this research, the photopolymerization kinetics of novel bulk thiol–ene systems have been compared with those of typical acrylate and methacrylate systems when polymerized in the presence of the photoiniferter p ‐xylene bis( N , N ‐diethyl dithiocarbamate) (XDT). In the presence of XDT, the thiol–ene systems photopolymerize more quickly than the traditional acrylate and methacrylate systems by one to two orders of magnitude. Fourier transform infrared spectroscopy has been used to monitor the photografting kinetics of various monomers on dithiocarbamate‐functionalized surfaces. Furthermore, this technique has been used to evaluate surface‐initiation kinetics and to emphasize the influence of bulk substrate properties on grafting kinetics. Finally, photopatterning has been demonstrated on a dithiocarbamate‐incorporated thiol–ene substrate with conventional photolithographic techniques.