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A new method was developed for the homogeneous deposition of silver nanoparticles on colloid silica spheres. The method does not make use of an external electron source, but of a chemical moiety adsorbed on the surface, which can easily get oxidized. The process is mainly performed in two steps: a first step in which the adsorption of Sn 2+ ions occurs on the surface of the silica particles and a second step comprising the addition of Ag + ions, which are reduced and simultaneously adsorbed on the surface, while Sn 2+ oxidizes to Sn 4+ . The whole process can be repeated to obtain a denser coating on the surface.
Kobayashi et al. (Tue,) studied this question.