Ni–Pd Catalytic Synergy on Rod‐Shaped CeO ₂ for Boosting Low‐Temperature CH ₄ Oxidation

The complete oxidation of methane (CH 4 ) at low temperatures remains a major challenge because of the high stability of the C–H bond. Efficient CH 4 abatement is essential for natural gas‐fueled combustion systems because unburned methane slip can offset the low‐carbon and energy‐efficiency advantages of natural gas utilization. Herein, a robust Ni–Pd bimetallic catalyst supported on rod‐shaped CeO 2 (NiPd/CeO 2 ) was elaborately constructed by the gas bubbling‐assisted membrane deposition method for low‐temperature CH 4 oxidation. Compared with single Pd/CeO 2 catalyst, NiPd/CeO 2 catalyst exhibits superior catalytic performance and stability during CH 4 oxidation, that is, its T 10 , T 50 , and T 90 values of CH 4 oxidation are 225°C, 276°C, and 298°C, respectively, and it can achieve complete CH 4 oxidation below 400°C. Characterization and mechanistic analyses demonstrate that deep CH 4 oxidation is controlled not only by C–H bond activation but also by O 2 adsorption–activation over the catalyst. The Ni–Pd synergy originates from Ni‐induced electronic modulation of PdO x , which strengthens O 2 adsorption–activation, and thereby promoting deep CH 4 oxidation. This study highlights an effective approach to improving Pd‐based CH 4 oxidation catalysts through bimetallic electronic regulation and provides a promising after‐treatment strategy for reducing CH 4 slip and enabling cleaner and more energy‐efficient natural gas use.