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Metasurfaces are one of the most promising devices to break through the limitations of bulky optical components. By offering a new method of light manipulation based on the light-matter interaction in subwavelength nanostructures, metasurfaces enable the efficient manipulation of the amplitude, phase, polarization, and frequency of light and derive a series of possibilities for important applications. However, one key challenge for the realization of applications for meta-devices is how to fabricate large-scale, uniform nanostructures with high resolution. In this review, we review the state-of-the-art nanofabrication techniques compatible with the manufacture of meta-devices. Maskless lithography, masked lithography, and other nanofabrication techniques are highlighted in detail. We also delve into the constraints and limitations of the current fabrication methods while providing some insights on solutions to overcome these challenges for advanced nanophotonic applications.
Leng et al. (Mon,) studied this question.