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Abstract Photovoltaic technologies based on perovskite absorber materials have led this optoelectronic field into a brand‐new horizon. However, the present antisolvents used in the one‐step spin‐coating method always encounter problems with the very narrow process window. Herein, anisole is introduced into the one‐step spin‐coating method, and the technology is developed to fabricate perovskite thin films with ultrawide processing window with a dimethylformamide (DMF):dimethyl sulfoxide (DMSO) ratio varying from 6:4 to 9:1 in the precursor solution, anisole dripping time ranging from 5 to 25 s, and an antisolvent volume varying from 0.1 to 0.9 mL. Perovskite thin films as large as 100 cm 2 are successfully fabricated using this method. Maximum photoelectric conversion efficiencies of 19.76% for small‐area (0.14 cm 2 ) and 17.39% for large‐area (1.08 cm 2 ) perovskite solar cell devices are obtained. It is also found that there are intermolecular hydrogen‐bonding forces between anisole and DMF/DMSO that play critical roles in the wide process window. These results provide a deeper understanding of the crystallizing procedure of perovskite during the one‐step spin‐coating process.
Zhao et al. (Wed,) studied this question.