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Metasurfaces, composed of two-dimensional nanostructures, exhibit remarkable capabilities in shaping wavefronts, encompassing phase, amplitude, and polarization. This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics, culminating in the development of flat and ultrathin optical devices. Particularly noteworthy is the all-dielectric-based metasurface, leveraging materials such as titanium dioxide, silicon, gallium arsenide, and silicon nitride, which finds extensive application in the design and implementation of high-performance optical devices, owing to its notable advantages, including a high refractive index, low ohmic loss, and cost-effectiveness. Furthermore, the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication, especially through wafer-scale nanofabrication technologies, thereby facilitating the realization of commercial applications for metasurfaces. This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas. These technologies, including standard nanolithography e.g., electron beam lithography (EBL) and focused ion beam (FIB) lithography, advanced nanolithography (e.g., grayscale and scanning probe lithography), and large-scale nanolithography e.g., nanoimprint and deep ultraviolet (DUV) lithography, are utilized to fabricate high-resolution, high-aspect-ratio, flexible, multilayer, slanted, and wafer-scale all-dielectric metasurfaces with intricate nanostructures. Ultimately, we conclude with a perspective on current cutting-edge nanofabrication technologies. © The Authors.
Yang et al. (Mon,) studied this question.