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September 25, 2000Physical Review LettersOpen Access

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit

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Authors

ABAgedi BotoYale UniversityPKPieter KokUniversity of SheffieldDADaniel S. AbramsLuminex (United States)

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Boto et al. (2000) studied this question.

synapsesocial.com/papers/6a6b8bc32ef98b0efacb5ebchttps://doi.org/10.1103/physrevlett.85.2733
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